{"product_id":"photomask-fabrication-technology-9780071445634","title":"Photomask Fabrication Technology","description":"\u003cb\u003ePublisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.\u003c\/b\u003e\u003cbr\u003e\u003cbr\u003e\u003cbr\u003ePhotomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.\u003cbr\u003e\u003cbr\u003eThis text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes\u003cbr\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003eAuthor:\u003c\/b\u003e Benjamin Eynon, Banqiu Wu\u003cbr\u003e\u003cb\u003ePublisher:\u003c\/b\u003e McGraw-Hill Companies\u003cbr\u003e\u003cb\u003ePublished:\u003c\/b\u003e 08\/01\/2005\u003cbr\u003e\u003cb\u003ePages:\u003c\/b\u003e 500\u003cbr\u003e\u003cb\u003eBinding Type:\u003c\/b\u003e Hardcover\u003cbr\u003e\u003cb\u003eWeight:\u003c\/b\u003e 2.03lbs\u003cbr\u003e\u003cb\u003eSize:\u003c\/b\u003e 9.28h x 6.16w x 1.75d\u003cbr\u003e\u003cb\u003eISBN:\u003c\/b\u003e 9780071445634\u003cbr\u003e\u003cp\u003e\u003cb\u003eAbout the Author\u003c\/b\u003e\u003cbr\u003e\u003cb\u003eBenjamin G. Eynon, Jr., \u003c\/b\u003e is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology. \u003c\/p\u003e\u003cp\u003e \u003cb\u003eBanqiu Wu, Ph.D.\u003c\/b\u003e is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.\u003cbr\u003e\u003c\/p\u003e\u003cp\u003e\u003ci\u003eThis title is not returnable\u003c\/i\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"McGraw-Hill Companies","offers":[{"title":"Hardcover","offer_id":39924027621491,"sku":"9.78E+12","price":128.95,"currency_code":"EUR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0555\/9255\/0515\/products\/img_4f0a15d7-4574-4764-b561-ceb257ef7e5e.jpg?v=1647436322","url":"https:\/\/bookstorenmore.com\/en-de\/products\/photomask-fabrication-technology-9780071445634","provider":"Bookstore N More","version":"1.0","type":"link"}